Iter India Ipr
Constant Power Mode DC Power Supply for Magnetron Sputtering Plasma Source
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Last updated on 06/18/2026.
Constant Power Mode DC Power Supply for Magnetron Sputtering Plasma Source
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Sputtering Target of Nickel, Sputtering Target of Carbon, Sputtering Target of Boron Carbide, Sputtering Target of Tungsten, Silicon Wafer of 2 inch diameter, Silicon Wafer of 3 inch diameter
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Sputtering Targets/ Sputtering Sources
Rectangular Cr Sputtering Target
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Molybdenum Di Silicide ( MoSi2) circular sputtering target
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